Nanomaterials growth

Our unit produces films using pulsed laser deposition techniques and MOCVD and works closely with many ICN2 research groups as well as external teams. A recently developed two-laser PLD configuration allows the co-operation of two targets for the deposition of composition gradient films, as well as new mixed composition materials. Our unit performs advanced structural characterization of thin films, mainly by X-ray diffraction, as well as working on the development of advanced methods for X-ray diffraction characterization of epitaxial thin films. These include plane diffraction, GIXRD analysis, as well as 3D reciprocal spatial mapping. This microstructure research is complemented by HRTEM characterization. We are especially interested in surface and interfacial phenomena, such as oxygen exchange kinetics. To this end we have developed a time-resolved XRD technique that controls the subtle chemical expansion produced in transition metal oxide thin films when their oxygen stoichiometry is changed. We aim to perform in situ and in-operand characterization by XRD in different solid state electrochemical devices. These studies have also been extended to in situ structural studies of ferroelectric and resistive switching materials, as well as photostrictive materials. In 2019 we also continued to work on the development of a thin film MOCVD process for the growth of high quality ultrafine transition metal dicalcogenides, starting with MoS 2, in collaboration with the ICN2 group led by Prof. . José A. Garrido.